JC's Chunson Limited

2025.08.12

Exhibition information

E+H Metrology MX608 —Redefining Manual Metrology for the Semiconductor Era



 

 

 

 

 

 

 Applications

• Semiconductor process inspection

• Wafer R&D and quality control

• Photovoltaic and related material testing

 


 

 

 

 

 

 Key Features

• All-in-One Measurement:   Simultaneously measures thickness, resistivity, and TTV of 150mm and 200mm silicon wafers


• Non-Contact Technology:  Utilizes advanced thickness sensors, resistivity sensors, and P/N dopant detection to protect wafer surfaces


• Fully Automated Scanning:  Wafer is automatically loaded and scanned along its centerline, with lateral resolution up to 1 mm


• Multi-Angle Inspection:  Automatic wafer rotation for up to 18 scans ensures complete coverage and accurate measurement results


• Software Integration:   Works with MX-NT operating software for efficient data analysis and control


• System Connectivity:  Connects to PC via serial interface and supports integration into automated robotic sorter systems


• Compact Desktop Design:  Small footprint and easy operation for use in laboratories, R&D, and production lines

 


 

   

SEMICON Taiwan 2025 | Taipei Nangang Exhibition Center