JC's Chunson Limited
ECO 500

ECO 500

G&N

Chemical-mechanical polishing technology (CMP) with precise process control

Wafer polishing and planarization

Cost-effective solution for polishing workpieces for the following applications: epi polishing, special parts polishing and backside thinning. Suitable for reclaim and prime wafer polishing.

Excellent polishing results with low polishing compound consumption

Small footprint